Simulation of light propagation in optical linear and nonlinear resist layers by finite difference beam propagation and other methods

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3734-3737

  Erdmann, A ^a   Henke, W ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0040773655     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588658     Document Type: Article

References (11)

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10. P. L. Liu, Q. Zhao, and F. W. Choa, IEEE Photonics Tech. Lett. 7, 890 (1995).
11. F. H. Dill, W. P. Hornberger, P. S. Hauge, and J. M. Shaw, IEEE Trans. Electron Devices 22, 445 (1975).