Nonlinear optical properties of photoresists for projection lithography

Applied Physics Letters

Volumn 68, Issue 4, 1996, Pages 455-457

  Kewitsch, Anthony S ^a   Yariv, Amnon ^a  

^a CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DIFFERENTIAL EQUATIONS; FOCUSING; NONLINEAR OPTICS; OPTICAL KERR EFFECT; OPTICAL PROPERTIES; PHOTOLITHOGRAPHY; POLYACRYLATES; REFRACTIVE INDEX; ULTRAVIOLET RADIATION;

DEPTH OF FOCUS; NUMERICAL APERTURE; PARAXIAL WAVE EQUATIONS; PHOTOPOLYMERS; PROJECTION LITHOGRAPHY; RESOLUTION ENHANCEMENT LAYER; SELF FOCUSING PHENOMENA; SELF TRAPPING PHENOMENA;

PHOTORESISTS;

EID: 0029771514     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116411     Document Type: Article

References (7)

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