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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3048, Issue , 1997, Pages 114-124

Influence of optical nonlinearities of the photoresist on the photolithographic process: Applications

(4) Erdmann, Andreas a Henderson, Clifford L b Willson, C Grant b Henke, Wolfgang a

a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT (Germany)

b The University of Texas at Austin (United States)

Author keywords

Focus drilling; Lithography simulation; Process optimization; Refractive index changes; Thick resist effects

Indexed keywords

ASPECT RATIO; NONLINEAR OPTICS; OPTIMIZATION; PHOTORESISTS;

FOCUS DRILLINGS; LITHOGRAPHY SIMULATION; OPTICAL NONLINEARITY; PHOTOLITHOGRAPHIC PROCESS; PROCESS PARAMETERS; REFRACTIVE INDEX CHANGES; SPECIAL APPLICATIONS; THICK RESIST;

REFRACTIVE INDEX;

EID: 0002812732 PISSN: 0277786X EISSN: 1996756X Source Type: Conference Proceeding
DOI: 10.1117/12.275810 Document Type: Conference Paper

Times cited : (12)

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