Photoemission study of energy alignment at the metal/Alq 3 interfaces

Applied Surface Science

Volumn 175-176, Issue , 2001, Pages 412-418

  Yan, Li ^a   Mason, M G ^b   Tang, C W ^b   Gao, Yongli ^a  

^a UNIVERSITY OF ROCHESTER   (United States)

^b EASTMAN KODAK COMPANY   (United States)

Author keywords

Alq 3; Interface; OLED; Photoelectron spectroscopy

Indexed keywords

ALUMINUM COMPOUNDS; BINDING ENERGY; CHARGE TRANSFER; DIFFUSION IN SOLIDS; DOPING (ADDITIVES); EMISSION SPECTROSCOPY; LIGHT EMITTING DIODES; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; SURFACE PHENOMENA; ULTRAVIOLET SPECTROSCOPY; VACUUM APPLICATIONS;

ORGANIC LIGHT EMITTING DIODES (OLED); ULTRAVIOLET PHOTOEMISSION SPECTROSCOPY (UPS); X RAY PHOTOEMISSION SPECTROSCOPY (XPS);

INTERFACES (MATERIALS);

EID: 0035873442     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00089-7     Document Type: Article

References (21)

1. Tang C.W., VanSlyke S.A. Appl. Phys. Lett. 913:1987;51.
2. VanSlyke S.A., Chen C.H., Tang C.W. Appl. Phys. Lett. 2160:1996;69.
3. Gao Y., Park K.T., Hsieh B.R. J. Appl. Phys. 73:1993;7894.
4. Choong V.-E., Mason M.G., Tang C.W., Gao Y. Appl. Phys. Lett. 72:1998;2689.
5. Le Quoc Toan, Yan Li, Gao Yongli, Mason M.G., Giesen D.J., Tang C.W. J. Appl. Phys. 87:2000;375.
6. Rajagopal A., Wu C.I., Kahn A. J. Appl. Phys. 83:1998;2649.
7. Ishii H., Seki K. IEEE Trans. Electron. Devices. 44:1997;1295.
8. Ishii H., Sugiyama K., Ito E., Seki K. Adv. Mater. 11:1999;605.
9. Schlaf R., Schroeder P.G., Nelson M.W., Parkinso B.A., Lee P.A., Nebesny K.W., Armstrong N.R. J. Appl. Phys. 86:1999;1499.
10. I.G. Hill, A.J. Makinen, Z.H. Kafafi, 88 (2000) 889.
11. Schlaf R., Parkinson B.A., Lee P.A., Nebesny K.W., Armstrong N.R. Appl. Phys. Lett. 73:1998;1026.
12. Horn K. Appl. Phys. A: Solids Surf. 51:1990;289.
13. Le Q.T., Yan L., Choong V.-E., Forsythe E.W., Mason M.G., Tang C.W., Gao Y. Synth. Met. 102:1999;1014.
14. Le Q.T., Mason M.G., Yan L., -E Choong V., Forsythe E.W., Tang C.W. Yongli Gao. Proc. SPIE. 3628:1999;64.
15. Johansson N., Osada T., Stafström S., Salaneck W.R., Parente V., dos Santos D.A., Crispin X., Brédas J.L. J. Chem. Phys. 111:1999;2157.
16. Lee S.T., Hou X.Y., Mason M.G., Tang C.W. Appl. Phys. Lett. 72:1998;1593.
17. Rajagopal A., Kahn A. J. Appl. Phys. 84:1998;355.
18. Curioni A., Andreoni W. J. Am. Chem. Soc. 121:1999;8216.
19. Burrows P.E., Shen Z., Bulovic V., McCarty D.M., Forrest S.R., Cronin J.A., Thompson M.E. J. Appl. Phys. 7991:1996;79.
20. Ofner H., Hofmann R., Kraft J., Netzer F.P., Paggel J.J., Horn K. Phys. Rev. B. 50:1994;120.
21. Jabbour G.E., Kippelen B., Armstrong N.R., Peyghambarian N. Appl. Phys. Lett. 73:1998;1185.