Chemical sputtering of amorphous silicon carbide under hydrogen bombardment

Applied Surface Science

Volumn 184, Issue 1-4, 2001, Pages 387-390

  Salonen, E ^a   Nordlund, K ^a   Keinonen, J ^a   Wu, C H ^b  

^a UNIVERSITY OF HELSINKI   (Finland)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Chemical sputtering; Divertor; Molecular dynamics; Silicon carbide

Indexed keywords

AMORPHOUS MATERIALS; CARBON; COMPUTER SIMULATION; CONTAMINATION; DOPING (ADDITIVES); HYDROGENATION; MOLECULAR DYNAMICS; PLASMAS; SPUTTERING;

CHEMICAL SPUTTERING;

SILICON CARBIDE;

EID: 0035852225     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00524-4     Document Type: Article

References (13)