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Volumn 266, Issue , 1999, Pages 1059-1064

Chemical sputtering yields of carbon based materials at high ion flux densities

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; EXPERIMENTAL REACTORS; PLASMA DENSITY; PLASMA FLOW; SCANNING ELECTRON MICROSCOPY; SPUTTERING;

EID: 0032635027     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00854-X     Document Type: Article
Times cited : (34)

References (13)
  • 9
    • 85031636873 scopus 로고    scopus 로고
    • these Proceedings
    • A. Kallenbach et al., these Proceedings.
    • Kallenbach, A.1
  • 13
    • 85031635454 scopus 로고    scopus 로고
    • private communication
    • D. Naujoks, private communication.
    • Naujoks, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.