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Volumn 266, Issue , 1999, Pages 1059-1064
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Chemical sputtering yields of carbon based materials at high ion flux densities
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Author keywords
[No Author keywords available]
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Indexed keywords
ENERGY DISPERSIVE SPECTROSCOPY;
EXPERIMENTAL REACTORS;
PLASMA DENSITY;
PLASMA FLOW;
SCANNING ELECTRON MICROSCOPY;
SPUTTERING;
CHEMICAL EROSION;
CHEMICAL SPUTTERING;
INTERNATIONAL THERMONUCLEAR EXPERIMENTAL REACTOR (ITER);
CARBON FIBERS;
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EID: 0032635027
PISSN: 00223115
EISSN: None
Source Type: Journal
DOI: 10.1016/S0022-3115(98)00854-X Document Type: Article |
Times cited : (34)
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References (13)
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