Thermal stability and chemical erosion of the silicon doped CFC material NS31

Journal of Nuclear Materials

Volumn 258-263, Issue PART 1 A, 1998, Pages 740-744

  Balden, M ^a   Roth, J ^a   Wu, C H ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; DEUTERIUM; DOPING (ADDITIVES); EVAPORATION; GRAPHITE; HEATING; ION BEAMS; ION BOMBARDMENT; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; THERMODYNAMIC STABILITY;

CHEMICAL EROSION;

CHLOROFLUOROCARBONS;

EID: 13744265597     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(98)00254-2     Document Type: Article

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