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Volumn 83, Issue 9, 1998, Pages 4610-4614

Characterization of the local structure of amorphous GaAs produced by ion implantation

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[No Author keywords available]

Indexed keywords


EID: 0000310346     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367244     Document Type: Article
Times cited : (44)

References (31)
  • 1
    • 0000113577 scopus 로고
    • edited by D. T. J. Heurle Elsevier, Amsterdam, and references therein
    • G. L. Olsen and J. A. Roth, in Handbook of Crystal Growth, edited by D. T. J. Heurle (Elsevier, Amsterdam, 1994), p. 255, and references therein.
    • (1994) Handbook of Crystal Growth , pp. 255
    • Olsen, G.L.1    Roth, J.A.2
  • 20
    • 0020193772 scopus 로고
    • and references therein
    • J. S. Blakemore, J. Appl. Phys. 53, R123 (1982), and references therein.
    • (1982) J. Appl. Phys. , vol.53
    • Blakemore, J.S.1
  • 24
    • 85034280999 scopus 로고    scopus 로고
    • note
    • In general, the detection of like-atom bonding in GaAs was inhibited by the similarity in atomic number, and hence backscattering amplitude and phase shift, of the lattice constituents. In contrast, a materials system such as InP is well suited to the study of implantation-induced like-atom bonding. Such measurements are now in progress.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.