Device performance of in situ steam generated gate dielectric nitrided by remote plasma nitridation

Applied Physics Letters

Volumn 78, Issue 24, 2001, Pages 3875-3877

  Al Shareef, H N ^a   Karamcheti, A ^a   Luo, T Y ^a   Bersuker, G ^a   Brown, G A ^a   Murto, R W ^a   Jackson, M D ^a   Huff, H R ^a   Kraus, P ^b   Lopes, D ^b   Olsen, C ^b   Miner, G ^b  

^a SEMATECH   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035844403     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1379363     Document Type: Article

References (12)

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