Temperature dependence of decomposition pathway of dimethylaluminum hydride

Journal of Crystal Growth

Volumn 181, Issue 4, 1997, Pages 437-440

  Matsumiya, Yasuo ^a   Nakajima, Kazuo ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Al CVD; Decomposition pathway; DMAH

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; FILM GROWTH; REACTION KINETICS; SECONDARY ION MASS SPECTROMETRY; THERMAL EFFECTS;

DIMETHYLALUMINUM HYDRIDE; QUADRUPOLE MASS SPECTROSCOPY (QMS);

ALUMINUM COMPOUNDS;

EID: 0031549816     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(97)00390-4     Document Type: Article

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