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Volumn 488, Issue 3, 2001, Pages 303-324

Disproportionation of dimethylalane on aluminum surfaces. Part II. Quantum chemistry studies

Author keywords

Ab initio quantum chemical methods and calculations; Aluminum; Chemical vapor deposition; Density functional calculations; Growth; Models of surface chemical reactions; Surface chemical reaction

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DECOMPOSITION; METALLIC FILMS; ORGANOMETALLICS; QUANTUM THEORY; SURFACE REACTIONS; THERMODYNAMICS;

DENSITY FUNCTIONAL THEORY (DFT); DIMETHYLALUMINUM HYDRIDE; SURFACE DISPROPORTIONATION MECHANISMS;

ALUMINUM COMPOUNDS;

EID: 0035839217 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(01)01069-X Document Type: Article

Times cited : (3)

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