Effects of tantalum adhesion layer on the properties of SrBi2Ta2O9 ferroelectric thin films

Applied Physics Letters

Volumn 79, Issue 23, 2001, Pages 3833-3835

  Leu, Ching Chich ^a   Yang, Ming Che ^a   Hu, Chen Ti ^a   Chien, Chao Hsin ^b   Yang, Ming Jui ^b   Huang, Tiao Yuan ^b  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035803212     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1423405     Document Type: Article

References (13)

1. B. Aurivillius, Ark. Kemi 1, 463 (1949).
2. K. Amanuma, T. Hase, and Y. Miyasaka, Appl. Phys. Lett. 66, 221 (1995).
3. S. T. Kim, H. H. Lee, M. Y. Lee, and W. J. Lee, Jpn. J. Appl. Phys., Part 1 36, 294 (1997).
4. H. J. Nam, H. H. Kim, and W. J. Lee, Jpn. J. Appl. Phys., Part 1 37, 3462 (1998).
5. H.-J. Nam, D.-K. Choi, and W.-J. Lee, Thin Solid Films 371, 264 (2000).
6. S.-H. Kim, D. J. Kim, J.-P. Maria, A. I. Kingon, S. K. Streiffer, J. Im, O. Auciello, and A. R. Krauss, Appl. Phys. Lett. 76, 496 (2000).
7. K. Hholloway, P. M. Fryer, C. Cabral, Jr., J. M. E. Harper, P. J. Bailey, and K. H. Kelleher, J. Appl. Phys. 71, 5433 (1992).
8. A. Grill, W. Kane, J. Viggiano, M. Brady, and R. Laibowitz, J. Mater. Res. 7, 3260 (1992).
9. D.-S. Yoon, H. K. Baik, S.-M. Lee, S.-I. Lee, H. Ryu, and H. J. Lee, J. Vac. Sci. Technol. B 16, 1137 (1998).
10. S. B. Desu, D. P. Vijay, X. Zhang, and B.-P. He, Appl. Phys. Lett. 69, 1719 (1996).
11. G. Schindler, W. Hartner, V. Joshi, N. Solayappan, G. Derbenwick, and C. Mazure, Integr. Ferroelectr. 17, 421 (1997).
12. R. Bruchhaus, D. Pitzer, O. Eibl, U. Scheithauer, and W. Hoseler, Mater. Res. Soc. Symp. Proc. 243, 123 (1992).
13. O. Auciello, A. R. Krauss, J. Im, and J. A. Schultz, Annu. Rev. Mater. Sci. 28, 375 (1998).