SCOPUS 정보 검색 플랫폼 - 논문 보기

메뉴 건너뛰기

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 3, 1998, Pages 1137-1141

Investigation of Pt/Ta diffusion barrier using hybrid conductive oxide (RuO2) for high dielectric applications

(6) Yoon, Dong Soo a Baik, Hong Koo a Lee, Sung Man b Lee, Sang In c Ryu, Hyun d Lee, Hwack Joo d

a Yonsei University (South Korea)

b Kangwon National University (South Korea)

c SAMSUNG Electronics (South Korea)

d Korea Research Institute of Standards and Science (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000694242 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: None Document Type: Article

Times cited : (21)

References (14)

1
- 0028542809
- H. N. Al-Shareef, A. I. Kingon, X. Chen, K. R. Bellur, and O. Auciello, J. Mater. Res. 9, 2968 (1994).
- (1994) J. Mater. Res. , vol.9 , pp. 2968
- Al-Shareef, H.N.¹ Kingon, A.I.² Chen, X.³ Bellur, K.R.⁴ Auciello, O.⁵

2
- 0345962141
- H. N. Al-Shareef, D. Dimos, T. J. Boyle, W. L. Warren, and B. A. Tuttle, Appl. Phys. Lett. 68, 690 (1996).
- (1996) Appl. Phys. Lett. , vol.68 , pp. 690
- Al-Shareef, H.N.¹ Dimos, D.² Boyle, T.J.³ Warren, W.L.⁴ Tuttle, B.A.⁵

3
- 0027911764
- D. Roy and S. B. Krupanidhi, Appl. Phys. Lett. 62, 1056 (1993).
- (1993) Appl. Phys. Lett. , vol.62 , pp. 1056
- Roy, D.¹ Krupanidhi, S.B.²

4
- 36449002472
- K. Screenivas, I. Reaney, T. Meader, N. Setter, C. Jagadish, and R. G. Elliman, J. Appl. Phys. 75, 232 (1994).
- (1994) J. Appl. Phys. , vol.75 , pp. 232
- Screenivas, K.¹ Reaney, I.² Meader, T.³ Setter, N.⁴ Jagadish, C.⁵ Elliman, R.G.⁶

5
- 36549092310
- S. Q. Wang, I. Raaijmakers, B. J. Burrow, S. Suther, S. Redkar, and K. B. Kim, J. Appl. Phys. 68, 5176 (1990).
- (1990) J. Appl. Phys. , vol.68 , pp. 5176
- Wang, S.Q.¹ Raaijmakers, I.² Burrow, B.J.³ Suther, S.⁴ Redkar, S.⁵ Kim, K.B.⁶

6
- 0008988230
- K. Holloway, P. M. Fryer, C. Cabrai, Jr., J. M. E. Harper, P. J. Bailey, and K. H. Kelleher, J. Appl. Phys. 71, 5433 (1992).
- (1992) J. Appl. Phys. , vol.71 , pp. 5433
- Holloway, K.¹ Fryer, P.M.² Cabrai Jr., C.³ Harper, J.M.E.⁴ Bailey, P.J.⁵ Kelleher, K.H.⁶

7
- 0027886510
- J. S. Reid, E. Kolawa, R. P. Ruiz, and M. A. Nicolet, Thin Solid Films 236, 319 (1993).
- (1993) Thin Solid Films , vol.236 , pp. 319
- Reid, J.S.¹ Kolawa, E.² Ruiz, R.P.³ Nicolet, M.A.⁴

8
- 36449001374
- J. O. Olowolafe, J. Li, J. W. Mayer, and E. G. Colgan, Appl. Phys. Lett. 58, 469 (1991).
- (1991) Appl. Phys. Lett. , vol.58 , pp. 469
- Olowolafe, J.O.¹ Li, J.² Mayer, J.W.³ Colgan, E.G.⁴

9
- 0030350060
- K. Kushida-Abdelghafar, M. Hiratani, K. Torii, and Y. Fujusaki, Integr. Ferroelectr. 13, 113 (1996).
- (1996) Integr. Ferroelectr. , vol.13 , pp. 113
- Kushida-Abdelghafar, K.¹ Hiratani, M.² Torii, K.³ Fujusaki, Y.⁴

10
- 0026982218
- A. Grill, W. Kane, J. Viggiano, M. Brady, and R. Laibowitz, J. Mater. Res. 7, 3260 (1992).
- (1992) J. Mater. Res. , vol.7 , pp. 3260
- Grill, A.¹ Kane, W.² Viggiano, J.³ Brady, M.⁴ Laibowitz, R.⁵

11
- 33751141886
- R. Dat, D. J. Lichtenwalner, O. Auciello, and A. I. Kingon, Appl. Phys. Lett. 64, 2673 (1991).
- (1991) Appl. Phys. Lett. , vol.64 , pp. 2673
- Dat, R.¹ Lichtenwalner, D.J.² Auciello, O.³ Kingon, A.I.⁴

12
- 0030232826
- Y. Fukuda, K. Numata, K. Aoki, and A. Nishimura, Jpn. J. Appl. Phys., Part 1 35, 5178 (1996).
- (1996) Jpn. J. Appl. Phys., Part 1 , vol.35 , pp. 5178
- Fukuda, Y.¹ Numata, K.² Aoki, K.³ Nishimura, A.⁴

13
- 0013069974
- EMIS Data Reviews Series, No. 14 INSPEC, London
- K. Maex and M. V. Rossum, Properties of Metal Suicides, EMIS Data Reviews Series, No. 14 (INSPEC, London, 1995).
- (1995) Properties of Metal Suicides
- Maex, K.¹ Rossum, M.V.²

14
- 3643060236
- J. O. Olowalafe, R. E. Jones, Jr., A. C. Campbell, R. I. Megde, C. J. Mogab, and R. B. Gregory, J. Appl. Phys. 73, 1764 (1993).
- (1993) J. Appl. Phys. , vol.73 , pp. 1764
- Olowalafe, J.O.¹ Jones Jr., R.E.² Campbell, A.C.³ Megde, R.I.⁴ Mogab, C.J.⁵ Gregory, R.B.⁶

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.