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Volumn 395, Issue 1-2, 2001, Pages 125-129

Investigations on doping of amorphous and nanocrystalline silicon films deposited by catalytic chemical vapour deposition

(4) Fonrodona, M a Soler, D a Bertomeu, J a Andreu, J a

a UNIVERSITY OF BARCELONA (Spain)

Author keywords

Amorphous silicon; Catalytic chemical vapour deposition; Doping efficiency; Nanocrystalline silicon

Indexed keywords

AMORPHOUS SILICON; CATALYST ACTIVITY; CRYSTALLIZATION; ELECTRONIC PROPERTIES; HYDROGENATION; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR DOPING; THERMAL EFFECTS;

PLASMA-DEPOSITED FILMS;

THIN FILMS;

EID: 0035800986 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01230-5 Document Type: Conference Paper

Times cited : (7)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.