Microcrystalline silicon thin film transistors obtained by hot-wire CVD

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 526-529

  Puigdollers, J ^a   Dosev, D ^a   Orpella, A ^a   Voz, C ^b   Peiro, D ^b   Bertomeu, J ^b   Marsal, L F ^c   Pallares, J ^b   Andreu, J ^c   Alcubilla, R ^a  

^a UNIVERSITAT POLITÈCNICA DE CATALUNYA   (Spain)

^b UNIVERSITAT ROVIRA I VIRGILI   (Spain)

^c UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

THIN FILM TRANSISTORS;

EID: 0033907221     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00252-4     Document Type: Article

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