Some investigations on the anisotropy of the chemical etching of (hk0) and (hhl) silicon plates in a NaOH 35% solution. Part I: 2D etching shapes

Active and Passive Electronic Components

Volumn 24, Issue 1, 2001, Pages 31-56

  Hodebourg, C A ^a   Tellier, C R ^b  

^a Ecole Nationale Superieure de   (France)

^b Inst des Microtechniques de   (France)

Author keywords

Anisotropic etching; NaOH etchant; Silicon

Indexed keywords

ANISOTROPY; ETCHING; MICROMACHINING; MICROSTRUCTURE; PIEZOELECTRICITY; SURFACE ROUGHNESS;

SILICON PLATES;

SILICON;

EID: 0035783733     PISSN: 08827516     EISSN: None     Source Type: Journal    
DOI: 10.1155/2001/80453     Document Type: Article

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