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Volumn 4557, Issue , 2001, Pages 49-57

Planarization of deep trenches

Author keywords

Deep trench; Deposition; LPCVD; PECVD; Planarization; Polymer dielectric

Indexed keywords

OXIDATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; POLYIMIDES; SPIN COATING;

EID: 0035763952     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.442970     Document Type: Conference Paper
Times cited : (5)

References (9)
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  • 2
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    • New thin film epitaxial polysilicon encapsulation for piezoresistive accelerometers
    • Interlaken, Switzerland
    • A. Partridge et al., New Thin Film Epitaxial Polysilicon Encapsulation for Piezoresistive Accelerometers, Proc. MEMS '01, Interlaken, Switzerland, p.54-59, 2001.
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    • Partridge, A.1
  • 3
    • 0001034527 scopus 로고    scopus 로고
    • New designs of micromachined vibrating rate gyroscopes with decoupled oscillation modes
    • Chicago, USA
    • W. Geiger et al., New designs of micromachined vibrating rate gyroscopes with decoupled oscillation modes, Proc. Transducers '97, Chicago, USA, p.1129, 1997.
    • (1997) Proc. Transducers '97 , pp. 1129
    • Geiger, W.1
  • 4
    • 0033149765 scopus 로고    scopus 로고
    • Sealing of micromachined cavities using chemical vapour deposition methods: Characterisation and optimisation
    • C. Liu, Y.-C. Tai, Sealing of micromachined cavities using chemical vapour deposition methods: Characterisation and optimisation, JMEMS 8 (2), p.135-145, 1999.
    • (1999) JMEMS , vol.8 , Issue.2 , pp. 135-145
    • Liu, C.1    Tai, Y.-C.2
  • 5
    • 0033353335 scopus 로고    scopus 로고
    • Planarization processes and applications I. Undoped GeO2-SiO2 glasses
    • D.L. Simpson et al., Planarization Processes and Applications I. Undoped GeO2-SiO2 Glasses, J. Electrochem. Soc. 146(10) p.3860-3871, 1999.
    • (1999) J. Electrochem. Soc. , vol.146 , Issue.10 , pp. 3860-3871
    • Simpson, D.L.1
  • 6
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    • Micromachined devices for space telecom applications
    • 15-17 May; Noordwijk, The Netherlands
    • H. Jansen at al., Micromachined devices for space telecom applications, Proc. 3rd Round Table on Micro/Nano-Technologies for Space. ESA, p. 135-140, 15-17 May 2000; Noordwijk, The Netherlands.
    • (2000) Proc. 3rd Round Table on Micro/Nano-Technologies for Space. ESA , pp. 135-140
    • Jansen, H.1
  • 7
    • 0032635182 scopus 로고    scopus 로고
    • Post-CMOS integration of germanium microstructures
    • Orlando, Florida, USA
    • A.E. Franke et al., Post-CMOS Integration of Germanium Microstructures, Proc. MEMS '99, Orlando, Florida, USA, p.630-637, 1999.
    • (1999) Proc. MEMS '99 , pp. 630-637
    • Franke, A.E.1
  • 9
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    • HF etching of Si-oxides and Si-nitrides for surface micromachining
    • Enschede, the Netherlands, May
    • B. Du Bois et al., HF etching of Si-oxides and Si-nitrides for surface micromachining, Proc. Dutch National Sensor Conference, Enschede, the Netherlands, May 2001.
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    • Du Bois, B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.