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Volumn 71, Issue 23, 1997, Pages 3400-3402

Preservation of atomically clean silicon surfaces in air by contact bonding

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000650378     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120348     Document Type: Article
Times cited : (9)

References (19)
  • 9
    • 85033279793 scopus 로고    scopus 로고
    • note
    • Analogous experiments have been carried out for Si(100) samples etched in dilute HF (10%) prior to contact bonding, and a 1 × 1 diffraction pattern of comparable quality was obtained.
  • 10
    • 85033318877 scopus 로고    scopus 로고
    • note
    • By Auger electron spectroscopy, we were not able to detect oxygen or fluorine on the samples, implying less than 2% coverage of these contaminants. A significant carbon signal was detected, consistent with other studies of HF-passivated surfaces.
  • 17


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.