Application of the aberration ring test (ARTEMIS™) to determine lens quality and predict its lithographic performance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1379-1387

  Moers, Marco ^a   Van der Laan, Hans ^a   Zellenrath, Mark ^a   De Boeij, Wim ^a   Beaudry, Neil ^b   Cummings, Kevin D ^b   Van Zwol, Adriaan ^a   Becht, Arthur ^a   Willekers, Rob ^a  

^a ASML   (Netherlands)

^b ASML US Inc   (United States)

Author keywords

3D structures; Aberration ring test; Aberrations; Image quality; Isolation pattern; Lithographic prediction; Optical lithography; Zernike coefficients

Indexed keywords

ABERRATIONS; COMPUTER SIMULATION; ELECTRIC FIELDS; IMAGE QUALITY; LENSES; LIGHTING; OPTICAL TESTING; PHASE SHIFT; SCANNING;

ABERRATION RING TESTS;

PHOTOLITHOGRAPHY;

EID: 0035759098     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.435676     Document Type: Article

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