Formation of absorption bands in F-doped silica under excimer laser exposure

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1080-1087

  Smith, Charlene M ^a   Moore, Lisa A ^a  

^a Corning Incorporated ^*  (United States)

Author keywords

Laser damage; Photomask; Silica

Indexed keywords

DOPING (ADDITIVES); FLUORESCENCE; FUSED SILICA; LASER DAMAGE; LIGHT ABSORPTION; MASKS; THERMAL EXPANSION;

PHOTOMASKS;

EXCIMER LASERS;

EID: 0035758821     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435640     Document Type: Conference Paper

References (15)

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