Transient absorption in excimer-exposed silica

Applied Optics

Volumn 39, Issue 31, 2000, Pages 5778-5784

  Smith, Charlene M ^a   Borrelli, Nicholas F ^a   Araujo, Roger J ^a  

^a Corning Incorporated ^*  (France)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; PHOTOLYSIS; RAMAN SCATTERING; SILICA;

TRANSIENT ABSORPTION;

EXCIMER LASERS;

EID: 0001641188     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.39.005778     Document Type: Article

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