Extreme high NA, high throughput scanner compatible 4 kHz KrF excimer laser for DUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4346, Issue 2, 2001, Pages 1617-1626

  Matsunaga, Takashi ^a   Enami, Tatsuo ^a   Kakizaki, Koji ^a   Saito, Takashi ^a   Tanaka, Satoshi ^a   Nakarai, Hiroaki ^a   Inoue, Toyoharu ^a   Igarashi, Tatsushi ^a  

^a GIGAPHOTON INC   (Japan)

Author keywords

CoO; Excimer laser; High repetition rate; High throughput; KrF; Lithography; Pulse stretching

Indexed keywords

BANDWIDTH; EXCIMER LASERS; FREQUENCIES; KRYPTON; LENSES; SCANNING;

PULSE STRETCHING; SCANNERS;

LITHOGRAPHY;

EID: 0035758728     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.435703     Document Type: Conference Paper

References (5)

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