130-nm KrF lithography for DRAM production with 0.68-NA scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (II), Issue , 2000, Pages 927-934

  Kawamura, E ^a   Nagai, K ^a   Kanemitsu, H ^a   Tabata, Y ^a   Inoue, S ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; PHOTOLITHOGRAPHY; SCANNING; THIN FILMS;

OPTICAL PROXIMITY CORRECTION (OPC); PHASE-SHIFT MASKS;

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0033681476     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.389088     Document Type: Conference Paper

References (6)