Durability of experimental fused silicas to 193-nm induced compaction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3051, Issue , 1997, Pages 44-53

  Schenker, Richard E ^a   Piao, Fan ^a   Oldham, William G ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIREFRINGENCE; COMPACTION; COMPUTER SIMULATION; FINITE ELEMENT METHOD; FUSED SILICA; MONITORING; RELIABILITY;

OPTICAL MICROLITHOGRAPHY; RESOLUTION ENHANCEMENT; STRESS BIREFRINGENCE;

PHOTOLITHOGRAPHY;

EID: 0031384977     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.275966     Document Type: Conference Paper

References (13)