High-repetition rate ArF excimer laser for 193-nm lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Kakizaki, Koji ^a   Saito, Takashi ^a   Mitsuhashi, Ken ichi ^a   Arai, Motohiro ^a   Tada, Akihumi ^a   Kasahara, Shinji ^a   Igarashi, Tatsushi ^a   Hotta, Kazuaki ^a  

^a Ushio Res Inst of Tech Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; LASER PULSES; LIGHT REFRACTION; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; PHOTOLITHOGRAPHY;

FULL WIDTH AT HALF MAXIMUM (FWHM); HIGH REPETITION RATE; LINE NARROWING; REFRACTIVE LENS SYSTEMS;

EXCIMER LASERS;

EID: 0033715231     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)