Highly durable, low CoO, mass production version of 2 kHz ArF excimer laser for DUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000 (II), Issue , 2000, Pages 1435-1444

  Enami, Tatsuo ^a   Wakabayashi, Osamu ^a   Ishii, Ken ^a   Terashima, Katsutomo ^a   Itakura, Yasuo ^a   Watanabe, Takayuki ^a   Ohta, Takeshi ^a   Ohbu, Ayako ^a   Kubo, Hirokazu ^a   Tanaka, Hirokazu ^a   Suzuki, Toru ^a   Sumitani, Akira ^a   Mizoguchi, Hakaru ^a  

^a KOMATSU LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BANDWIDTH; LASER PULSES; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY;

COST OF OPERATION (COO); DEEP ULTRAVIOLET (DUV) LITHOGRAPHY; HIGH REPETITION RATE;

EXCIMER LASERS;

EID: 0033713108     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.388981     Document Type: Conference Paper

References (6)