Nano-indentation studies of Xerogel and SiLK low-K dielectric materials

Journal of Electronic Materials

Volumn 30, Issue 12, 2001, Pages 1527-1531

  Sikder, A K ^a   Irfan, I M ^a   Kumar, Ashok ^a   Anthony, J M ^a  

^a University of South Florida   (United States)

Author keywords

Continuous stiffness measurement (CSM); Hardness; Low K material; Modulus; Nano indentation

Indexed keywords

AEROGELS; HARDNESS; INDENTATION; INTEGRATED CIRCUIT MANUFACTURE; PERMITTIVITY; SCANNING ELECTRON MICROSCOPY; SILICA; STIFFNESS;

NANO-INDENTATION;

DIELECTRIC FILMS;

EID: 0035738742     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-001-0169-x     Document Type: Article

References (13)