Shallow donors in silicon coimplanted with rare-earth ions and oxygen

Physica B: Condensed Matter

Volumn 308-310, Issue , 2001, Pages 350-353

  Emtsev Jr , V V ^a   Ammerlaan, C A J ^a   Andreev, B A ^b   Oganesyan, G A ^c   Poloskin, D S ^c   Sobolev, N A ^c  

^a UNIVERSITY OF AMSTERDAM   (Netherlands)

^b INSTITUTE FOR PHYSICS OF MICROSTRUCTURES   (Russian Federation)

^c IOFFE INSTITUTE   (Russian Federation)

Author keywords

Implantation; Rare earth ions; Silicon; Thermal donors

Indexed keywords

CRYOGENICS; CRYSTAL GROWTH FROM MELT; ELECTRIC CONDUCTIVITY; ION IMPLANTATION; RARE EARTH ADDITIONS;

THERMAL DONORS;

SILICON WAFERS;

EID: 0035671156     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(01)00697-4     Document Type: Article

References (10)