Structural characterization of SiF4, SiH4 and H2 hot-wire-grown microcrystalline silicon thin films with large grains

Materials Research Society Symposium - Proceedings

Volumn 664, Issue , 2001, Pages A341-A346

  Gutierrez, J J ^a   Inglefield, C E ^a   An, C P ^a   DeLong, M C ^a   Taylor, P C ^a   Morrison, S ^a   Madan, A ^a  

^a WEBER STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; CRYSTALS; GRAIN SIZE AND SHAPE; RAMAN SPECTROSCOPY; SILICON COMPOUNDS; VOLUME FRACTION; X RAY DIFFRACTION ANALYSIS;

MICROCRYSTALLINE SILICON THIN FILMS;

THIN FILMS;

EID: 0035558232     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-664-a3.4     Document Type: Article

References (15)

1. Physics and electronic properties of microcrystalline semiconductors