IF MEMS filters for mobile communication

IEEE International Conference on Emerging Technologies and Factory Automation, ETFA

Volumn 2, Issue , 2001, Pages 733-736

  Quevy E ^a   Galayko, D ^a   Legrand, B ^a   Renaux, C ^b   Combi, C ^c   Flandre, D ^b   Buchaillot, L ^a   Collard, D ^d   Vigna, B ^c   Kaiser, A ^a  

^a INSTITUT D ELECTRONIQUE   (France)

^b UNIVERSITÉ CATHOLIQUE DE LOUVAIN   (Belgium)

^c STMICROELECTRONICS   (Italy)

^d UNIVERSITY OF TOKYO   (Japan)

Author keywords

Epitaxial polysilicon; IF filters; Resonators; SOI CMOS; Surface micromachining; Wireless transceiver

Indexed keywords

EPITAXIAL POLYSILICON; FULLY INTEGRATED SINGLE CHIP SYSTEM; SURFACE MICROMACHINING;

INTEGRATED CIRCUIT LAYOUT; MICROELECTROMECHANICAL DEVICES; MICROPROCESSOR CHIPS; MOBILE TELECOMMUNICATION SYSTEMS; POLYSILICON; RESONATORS; SILICON ON INSULATOR TECHNOLOGY; TRANSCEIVERS;

ELECTRIC FILTERS;

EID: 0035557308     PISSN: 19460740     EISSN: 19460759     Source Type: Journal    
DOI: 10.1109/ETFA.2001.997770     Document Type: Article

References (7)

1. Micromachined devices for wireless communications
2. Surface micromachining for microelectromechanical systems
3. High order medium frequency micromechanical electronic filters
4. A sub-micron capacitive gap process for multiple-metal-electrode lateral micromechanical resonators
5. Fully depleted SOI CMOS technology for low-voltage low-power mixed digital/analog/microwave circuits