Characterization of damage induced by cluster ion implantation

Materials Research Society Symposium - Proceedings

Volumn 669, Issue , 2001, Pages J451-J456

  Aoki, Takaaki ^a   Matsuo, Jiro ^a   Takaoka, Gikan ^a  

^a OSAKA SCIENCE AND TECHNOLOGY CENTER   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; ANNEALING; COMPUTER SIMULATION; DIFFUSION IN SOLIDS; ION IMPLANTATION; IRRADIATION; MOLECULAR DYNAMICS; MONOMERS; POINT DEFECTS; SEMICONDUCTING SILICON;

DAMAGE STRUCTURES;

SEMICONDUCTING BORON;

EID: 0035557119     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: 10.1557/proc-669-j4.5     Document Type: Article

References (11)