SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 670, Issue , 2001, Pages

Dual work function CMOS gate technology based on metal interdiffusion

(4) Polishchuk, Igor a Ranade, Pushkar a King, Tsu Jae a Hu, Chenming a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC DEVICES; ELECTRODES; ETCHING; GATES (TRANSISTOR); INTERDIFFUSION (SOLIDS); INTERFACES (MATERIALS); MOSFET DEVICES; SURFACES; THRESHOLD VOLTAGE;

CONDUCTION BAND;

CMOS INTEGRATED CIRCUITS;

EID: 0035556405 PISSN: 02729172 EISSN: None Source Type: Conference Proceeding
DOI: 10.1557/proc-670-k5.1 Document Type: Conference Paper

Times cited : (2)

References (8)

1
- 0005872806
- Int. Symp. on VLSI Technology, Systems, and Applications. 1993
- (1993) Proceedings of Technical Papers , vol.86
- Schuegraf, K.F.¹ King, C.C.² Hu, C.³

2
- 0032266791
- IEEE
- (1998) International Electron Devices Meeting 1998 , pp. 609
- Luan, H.F.¹ Wu, B.Z.² Kang, L.G.³ Vrtis, R.⁴ Roberts, D.⁵ Kwong, D.L.⁶

3
- 0034453391
- IEEE
- (2000) International Electron Devices Meeting 2000 , pp. 27
- Lee, C.H.¹ Luan, H.F.² Bai, W.P.³ Lee, S.J.⁴ Jeon, T.S.⁵ Senzaki, Y.⁶ Roberts, D.⁷ Kwong, D.L.⁸

4
- 0033700304
- IEEE
- (2000) 2000 Symposium on VLSI Technology , pp. 72
- Lu, Q.¹ Yeo, Y.-C.² Ranade, P.³ Takeuchi, H.⁴ King, T.-J.⁵ Hu, C.⁶ Song, S.C.⁷ Luan, H.F.⁸ Kwong, D.L.⁹

5
- 84996172954
- (1963) Phil. Mag. , vol.8 , pp. 1269
- Gibbs, G.B.¹ Graham, D.² Tomlin, D.H.³

6
- 0005836538
- (1997) Int. Semiconductor Device Research Symp. , vol.623
- Yu, B.¹ Tung, Y.-T.² Tang, S.³ Hui, E.⁴ King, T.-J.⁵ Hu, C.⁶

7
- 0003610719
- John Whley & Sons, New York
- (1982) MOS (Metal Oxide Semiconductor) Physics and Technology , pp. 467
- Nicollian, E.H.¹ Brews, J.R.²

8
- 0000271715
- (2000) IEEE Transactions on Electron Devices , vol.47 , pp. 1028
- Yagishita, A.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.