SCOPUS 정보 검색 플랫폼

Volumn , Issue , 2001, Pages 253-259

SiCOH dielectrics: From low-κ to Ultralow-κ by PECVD

(3) Grill, A a Edelstein, D a Patel, V a

a IBM T J WATSON RESEARCH CENTER (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC CONNECTORS; ELECTRIC INSULATING MATERIALS; MIXTURES; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; THERMODYNAMIC STABILITY;

MULTIPHASE FILMS;

DIELECTRIC FILMS;

EID: 0035555354 PISSN: 10480854 EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.