Effect of resist sensitivity ratio on T-gate fabrication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2494-2498

  Chen, Y ^a   Macintyre, D S ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

MATHEMATICAL MODELS; POLYMETHYL METHACRYLATES; PROCESS CONTROL; RESISTORS; SENSITIVITY ANALYSIS;

FOOTWIDTH CONTROL; RESIST SENSITIVITY RATIO;

GATES (TRANSISTOR);

EID: 0035519148     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1420577     Document Type: Article

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