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Volumn 53, Issue 1, 2000, Pages 349-352

Study of electron forward scattering effects on the footwidth of T-gates fabricated using a bilayer of PMMA and UVIII

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRON BEAM LITHOGRAPHY; GATES (TRANSISTOR); INTEGRATED CIRCUIT MANUFACTURE; MONTE CARLO METHODS; PHOTORESISTS; POLYMETHYL METHACRYLATES; SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0034207249     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00331-2     Document Type: Article
Times cited : (7)

References (14)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.