T-gate fabrication using a ZEP520A/UVIII bilayer

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 939-943

  Chen, Y ^a   MacIntyre, D ^a   Thoms, S ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

Author keywords

Electron beam lithography; T gates; UVIII; ZEP520A

Indexed keywords

DRY ETCHING; FABRICATION; SENSITIVITY ANALYSIS;

T-GATE FABRICATIONS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035450402     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00475-0     Document Type: Conference Paper

References (7)