Influence of optical parameters of synchrotron radiation lithography beamline on pattern replication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 3, 1996, Pages 1922-1928

  Shimano, Hiroki ^a   Ozaki, Yoshihiko ^a   Marumoto, Kenji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

Auger electron; Beamline; Pattern replication; Photoelectron; Spectrum; SR lithography

Indexed keywords

COMPUTER SIMULATION; ELECTRON EMISSION; ELECTRON SCATTERING; FILMS; LIGHT ABSORPTION; MASKS; OPTICAL PROPERTIES; OPTICS; PHOTONS; PHOTORESISTS; SUBSTRATES; SYNCHROTRON RADIATION;

ANGULAR DIVERGENCE; ATOMIC NUMBER; BEAMLINE OPTICS; COMPACT STORAGE RING; OPTICAL PARAMETERS; PATTERN REPLICATION; SYNCHROTRON RADIATION LITHOGRAPHY BEAMLIKE;

X RAY LITHOGRAPHY;

EID: 0030101624     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1922     Document Type: Article

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