Dominant plasma species for TiN film formation by plasma CVD

Journal of Physics D: Applied Physics

Volumn 30, Issue 17, 1997, Pages 2397-2402

  Rodrigo, A B ^a   Lasorsa, C ^a   Shimozuma, M ^b   Alvarez, F ^a   Perillo, P ^a  

^a DEPARTAMENTO DE FÍSICA   (Argentina)

^b HOKKAIDO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS;

PLASMA CHEMICAL VAPOR DEPOSITION (PCVD);

TITANIUM NITRIDE;

EID: 0031558470     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/17/005     Document Type: Article

References (13)

1. Lasorsa C, Shimozuma M and Rodrigo A B 1994 Abstracts IEEE Int. Conf. on Plasma Science (Santa Fe, NM, 1994) paper IP34
2. Talbot L and Chou Y S 1969 Proc. 6th. Symp. on Ratified Gas Dynamics vol 2, ed C L Brundin (New York: Academic) pp 1723-37
3. McWhirter R W P 1965 Plasma Diagnostic Techniques ed R H Huddlestone and S L Leonard (New York: Academic) ch 5
4. Sakaki M and Sakakibara T 1994 IEEE Trans. Plasma Sci. 22 1049-54
5. Ishii Y, Shibata T, Yoshino Y, Ichimura H and Kobayashi K 1992 J. Ceram. Soc. Japan 100 1184-91
6. Shemansky D E 1969 J. Chem. Phys. 51 682 Shemansky D E 1969 J. Chem. Phys. 51 689
7. Shemansky D E 1969 J. Chem. Phys. 51 682 Shemansky D E 1969 J. Chem. Phys. 51 689
8. McDaniel E W 1964 Collision Phenomena in Ionized Gases (New York: Wiley)
9. Kumar S and Ghosh P K 1993 J. Phys. D: Appl. Phys. 26 1419-26
10. Hurley R E 1981 Thin Solid Films 86 241-53
11. Chapman B 1980 Glow Discharge Processes (New York: Wiley)
12. Piper LG 1989 J. Chem. Phys. 91 864-73
13. Sperlein R F and Golde M F 1988 J. Chem. Phys. 89 3113-23