Deposition of DLC films in CH4/Ar and CH4/Xe r.f. plasmas

Diamond and Related Materials

Volumn 5, Issue 9, 1996, Pages 919-922

  Mutsukura, Nobuki ^a   Yoshida, Katsu Ichi ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

DLC film; Hard coatings; Plasma diagnostics; RF plasma CVD

Indexed keywords

EID: 0000575308     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00495-5     Document Type: Article

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