Effect of gas composition and bias voltage on the structure and properties of a-C:H/SiO2 nanocomposite thin films prepared by plasma-enhanced chemical-vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 5, 1996, Pages 2702-2708

  Lee, Jung H ^a,b   Lee, Young H ^a   Farouk, Bakhtier ^a  

^a Drexel University   (United States)

^b Hynix Semiconductor Inc   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030516612     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580191     Document Type: Article

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