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Volumn 41, Issue 11, 2001, Pages 1771-1779

Breakdown and latent damage of ultra-thin gate oxides under ESD stress conditions

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC BREAKDOWN; ELECTRIC RECTIFIERS; GATES (TRANSISTOR); SEMICONDUCTOR DEVICE MODELS; THYRISTORS;

EID: 0035501170     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(01)00033-6     Document Type: Conference Paper
Times cited : (15)

References (23)
  • 2
    • 0023548137 scopus 로고
    • The effects of high electric field transients on thin gate oxide MOSFETs
    • (1987) EOS/ESD Symp , pp. 252-257
    • Fong, Y.1
  • 3
  • 4
    • 0030398616 scopus 로고    scopus 로고
    • Very-fast transmission line pulse of integrated structures and the charged device model
    • (1996) EOS/ESD Symp , pp. 85-94
    • Gieser, H.1
  • 6
    • 0033279806 scopus 로고    scopus 로고
    • Analyzing the switch behavior of ESD-protection transistors by very fast transmission line pulsing
    • (1999) EOS/ESD Symp , pp. 28-37
    • Wolf, H.1
  • 9
    • 0026406199 scopus 로고
    • Non-uniform ESD current distribution due to improper metal routing
    • (1991) EOS/ESD Symp , pp. 104-109
    • Krieger, G.1
  • 13
  • 17
    • 0042786086 scopus 로고    scopus 로고
    • Electron energy dependence of metal-oxide-semiconductor degradation
    • (1999) Appl Phys Lett , vol.75 , Issue.16 , pp. 2287-2295
    • DiMaria, D.J.1
  • 20


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.