Turning points, power transfer, and frequency response of mode transitions in RF plasmas

Physica Scripta

Volumn 64, Issue 4, 2001, Pages 360-365

  Tsakadze, E L ^a   Ostrikov, K N ^a,b,c,d,e   Xu, S ^a,b   Long, J ^a   Jiang, N ^a   Tsakadze, Z L ^a   Yu, M Y ^d   Storer, R ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b FLINDERS UNIVERSITY   (Australia)

^c NAGOYA UNIVERSITY   (Japan)

^d RUHR UNIVERSITY BOCHUM   (Germany)

^e NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROSTATICS; ETCHING; FREQUENCY RESPONSE; HYSTERESIS; SILICON WAFERS; THIN FILMS;

RADIO FREQUENCY (RF) PLASMAS;

INDUCTIVELY COUPLED PLASMA;

EID: 0035476097     PISSN: 00318949     EISSN: None     Source Type: Journal    
DOI: 10.1238/Physica.Regular.064a00360     Document Type: Article

References (14)