Process controlled microstructural and binding properties of hard physical vapor desposition films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 3, 1998, Pages 1956-1962

  Oechsner, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM FLUX; ATOMIC BINDING; BINDING PROPERTIES; ENERGY INPUTS; GRAIN SIZE; HARD CARBON; ION ENERGIES; MICRO-STRUCTURAL; NITRIDE FILMS; PLASMA BEAM; TEXTURE DEVELOPMENT; TIN FILMS;

BINDING ENERGY; CARBON FILMS; CHEMICAL MODIFICATION; ION BEAM ASSISTED DEPOSITION; IONS; PLASMA DEPOSITION; TITANIUM NITRIDE;

FILM GROWTH;

EID: 0007590582     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581203     Document Type: Article

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