Fabrication of microrelief surfaces using a One-Step lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3226, Issue , 1997, Pages 2-10

  Reimer, K ^a   Hofmann, U ^a   Jurss M ^a   Pilz, W ^a   Quenzer, H J ^a   Wagner, B ^a  

^a FRAUNHOFER INSTITUTE FOR SILICON TECHNOLOGY ISIT   (Germany)

Author keywords

Lithography; Microfabrication; Microoptics; Microsystems; Resists; Surfacetopography

Indexed keywords

ANISOTROPIC ETCHING; DESIGN; ETCHING; JOINTS (STRUCTURAL COMPONENTS); LENSES; MACHINING; MASKS; MEMS; MICROANALYSIS; MICROELECTROMECHANICAL DEVICES; MICROELECTRONIC PROCESSING; MICROFABRICATION; MICROMACHINING; MICROSYSTEMS; OPTICAL INSTRUMENTS; PLASMA ETCHING; SMELTING; STANDARDIZATION; SURFACES; TECHNOLOGY;

3D DESIGNS; BINARY OPTICAL ELEMENTS; DATA FORMATS; DEGREE OF FREEDOMS; DESIGN AND CONTROLS; DESIGN CAPABILITIES; DESIGN REPRESENTATIONS; ETCHING PROCESSES; FIRST ORDERS; HEIGHT PROFILES; IC MANUFACTURING; KEY PROCESSES; KOH ETCHINGS; LASER WRITINGS; MACHINING TECHNOLOGIES; MASK MAKINGS; MASK PROCESSES; METAL LAYERS; MICROMACHINING TECHNOLOGIES; MICRORELIEF; NEW TECHNOLOGIES; ONE STEPS; OPTICAL LENSES; PLANAR TECHNOLOGIES; RESIST PROCESSES; RESISTS; SACRIFICIAL LAYERS; SHAPED GRATINGS; STEP LITHOGRAPHIES; SUBSTRATE MATERIALS; SURFACETOPOGRAPHY; THICK RESISTS;

DRY ETCHING;

EID: 57649174862     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284557     Document Type: Conference Paper

References (9)

1. Doldissen, H. Engel J. Wengelink and H.J. Hensel, "Lithographic fabrication of integrated micro-optical elements", Proc. Eur. Conf. Int. Optics (ECIO '93), Neuchatel, Switzerland, pp. 4-10, April 1993
2. R. Purdy, "brication of complex micro-optic components using photo-sculpting through half-tone transmission masks", IOP Conf., Focus on Micromechanics, Warwik, IOP Publishing, London, June 1993
3. Gal, "Micro-optics technology development for advanced sensors", Proc. Diffractive and Miniaturised Optics, San Diego, CA, USA, Vol. CR49, SPIE Press, Bellingham, Washington, pp. 329-359, July 1993
4. Oppliger, P. Sixt, J. M. Stauffer, J. M. Mayer, P. Regnault and G. Vorin, "One-step 3D shaping using a grey-tone mask for optical and microelectronic applications", Microelectron. Eng. 23 (1994), pp. 449-454
5. J. Quenzer, W. Henke, W. Hoppe, W. Pilz, K. Reimer, B. Wagner, "brication of relief-topographic surfaces with a onestep UV-lthographic process", Microsystem Technologies 1, Springer-Verlag 1995, pp. 196-201, 1995
6. Reimer, W. Henke, H. J. Quenzer, W. Pilz, B. Wagner, "One-level gray-tone design - mask data preparation and pattern transfer", Microelectronic Engineering 30 (1996), pp. 559-562
7. W. Goodman, "troduction to Fourier Optics", McGraw-Hill, New York 1968
8. Henke, G. Czech, "Simulation of lithographic images and resist profiles", Microelectronic Engineering Vol. 1, p. 629, 1990
9. Ds̈hner, M. Larsson, S. H. Lee, "Fabrication of monolithic diffractive optical elements by the use of e-beam direct write on an analog resist and a single chemically assited ion-beam-etching step",Applied Optics, Vol. 34, NO. 14, May 1995