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Surface and Interface Analysis

Volumn 31, Issue 9, 2001, Pages 881-889

Analysis of the x-ray photoelectron energy-loss background in silicides

(3) Castle, J E a Salvi, A M b Guascito, M R b

a UNIVERSITY OF SURREY (United Kingdom)

b UNIVERSITY OF BASILICATA (Italy)

Author keywords

FeSi2; MoSi2; X ray photoelectron background structure; XPS

Indexed keywords

ALUMINUM COMPOUNDS; BAND STRUCTURE; CHEMICAL BONDS; INTERMETALLICS; MOLECULAR STRUCTURE; X RAY PHOTOELECTRON SPECTROSCOPY;

SILICIDES;

SILICON COMPOUNDS;

EID: 0035444555 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1124 Document Type: Article

Times cited : (8)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.