SCOPUS 정보 검색 플랫폼

Surface and Interface Analysis

Volumn 32, Issue 1, 2001, Pages 91-94

Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy

(5) Franta, D a Ohlidal I a Klapetek, P a Pokorny P b Ohlidal M c

a MASARYK UNIVERSITY (Czech Republic)

b INSTITUTE OF SCIENTIFIC INSTRUMENTS (Czech Republic)

c BRNO UNIVERSITY OF TECHNOLOGY (Czech Republic)

Author keywords

AFM; Inhomogeneous ZrO2 films; Optical characterization

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; REFRACTIVE INDEX; SILICON WAFERS; SINGLE CRYSTALS; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; ZIRCONIA;

NEAR-NORMAL INCIDENCE SPECTROSCOPIC REFLECTOMETRY (NNSR); OPTICAL CHARACTERIZATION;

THIN FILMS;

EID: 0035419194 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1013 Document Type: Article

Times cited : (22)

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