Sensitivity of variable angle spectroscopic ellipsometry to isotropic thin film properties

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 31-37

  Urban III, F K ^a   Barton, D ^a  

^a The Department of Electrical and Computer Engineering   (United States)

Author keywords

Ellipsometry; Optical measurement; Optical properties; Thin films

Indexed keywords

COMPUTER SIMULATION; ELLIPSOMETRY; EXPERT SYSTEMS; FUSED SILICA; MEASUREMENT ERRORS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; ZIRCONIA;

ISOTROPIC THIN FILMS;

OPTICAL FILMS;

EID: 0031247651     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0040-6090(97)00670-6     Document Type: Article

References (6)

1. R.M.A. Azzam and N.M. Bashara, Ellipsometry and Polarized Light, North-Holland, New York, 1977.
2. I. An and R.W. Collins, Rev. Sci. Instrum., 62 (1991) 1904.
3. Matlab, High-Performance Numeric Computation and Visualization Software, Reference Guide, The MathWorks, Inc., Natick, MA.
4. F.K. Urban III and J.C. Comfort, Thin Solid Films, 253 (19??) 262.
5. W.H. Press, B.P. Flannery, S.A. Teukolsky and W.T. Vetterling, Numerical Recipes the Art of Scientific Computing, Cambridge University Press, New York, 1990.
6. F.K. Urban III, P.R. Athey, J. Elman, G. Exarhos, G.E. Jellison Jr., C. Pickering, J.A. Woollam and M. Yamamoto, J. Vac. Sci. Tech., (1997) in press.