Complete optical characterization of the SiO2/Si system by spectroscopic ellipsometry, spectroscopic reflectometry and atomic force microscopy

Surface and Interface Analysis

Volumn 28, Issue 1, 1999, Pages 240-244

  Ohlidal I ^a   Franta, D ^a   Pincik E ^b   Ohlidal M ^c  

^a MASARYK UNIVERSITY   (Czech Republic)

^b INSTITUTE OF PHYSICS   (Slovakia)

^c BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; MATHEMATICAL MODELS; REFLECTOMETERS; SEMICONDUCTING SILICON COMPOUNDS; SILICA; SUBSTRATES;

OPTICAL CONSTANTS; SPECTROSCOPIC ELLIPSOMETRY; SPECTROSCOPIC REFLECTOMETRY;

SEMICONDUCTING SILICON;

EID: 0039424586     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1096-9918(199908)28:1<240::AID-SIA585>3.0.CO;2-#     Document Type: Article

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