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Applied Spectroscopy

Volumn 55, Issue 8, 2001, Pages 1053-1059

Monitoring dielectric thin-film production on product wafers using infrared emission spectroscopy

(3) Niemczyk, T M a Zhang, S a Haaland, D M a

a UNIVERSITY OF NEW MEXICO (United States)

Author keywords

Borophosphosilicate glass (BPSG); Dielectric thin films; IR emission; Multivariate calibration; Partial least squares (PLS)

Indexed keywords

BORON COMPOUNDS; DIELECTRIC FILMS; INFRARED SPECTROSCOPY; INTEGRATED CIRCUIT MANUFACTURE; LEAST SQUARES APPROXIMATIONS; SEMICONDUCTING GLASS;

BOROPHOSPHOSILICATE GLASS; DIELECTRIC THIN FILM; FILM THICKNESS; INFRARED EMISSION SPECTROSCOPY; MULTIVARIATE ANALYSIS;

EMISSION SPECTROSCOPY;

EID: 0035414707 PISSN: 00037028 EISSN: None Source Type: Journal
DOI: 10.1366/0003702011952956 Document Type: Article

Times cited : (5)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.