Testing of a rapid fault detection model for quality control: Borophosphosilicate glass thin films monitored by infrared absorption spectroscopy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 4, 1997, Pages 955-960

  Zhang, S ^a   Franke, J E ^a   Niemczyk, T M ^a   Haaland, D M ^b   Cox, J N ^c   Banerjee, I ^c  

^a UNIVERSITY OF NEW MEXICO   (United States)

^b SANDIA NATIONAL LABORATORIES   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; BOROSILICATE GLASS; CHEMICAL VAPOR DEPOSITION; INFRARED SPECTROSCOPY; MATHEMATICAL MODELS; QUALITY CONTROL;

BOROPHOSPHOSILICATE GLASS; COMPONENT ANALYSIS; MAHALANOBIS DISTANCES;

THIN FILMS;

EID: 0031189862     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589514     Document Type: Article

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